GENEVA, Nov. 4 -- ASAHI KASEI KABUSHIKI KAISHA (1-1-2 Yurakucho, Chiyoda-ku, Tokyo1000006), 旭化成株式会社 (東京都千代田区有楽町一丁目１番２号) filed a patent application (PCT/JP2025/015757) for "PHOTOSENSITIVE RESIN COMPOSITION, AND CURED RELIEF PATTERN PRODUCTION METHOD, CURED FILM, AND POLYIMIDE FILM PRODUCTION METHOD USING PHOTOSENSITIVE RESIN COMPOSITION" on Apr 23, 2025. With publication no. WO/2025/225661, the details related to the patent application was published on Oct 30, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which...