INTERNATIONAL PATENT: ARRAYED MATERIALS (CHINA) CO., LTD., 深圳市矩阵多元科技有限公司 FILES APPLICATION FOR "MAGNETRON SPUTTERING APPARATUS FOR DETECTING SHORT CIRCUIT OF TARGET IN TIME BY MONITORING RESISTANCE BETWEEN PVD TARGET CATHODE AND ELECTRICAL GROUNDING IN REAL TIME AND CONTROL METHOD"

GENEVA, Oct. 3 -- ARRAYED MATERIALS (CHINA) CO., LTD. (1/F and 2/F, 101, Building 6, Longwu Industrial Zone, Shangfen Community, Minzhi Street, Longhua DistrictShenzhen, Guangdong 518131), 深圳市矩阵多元科技有限公司 (中国广东省深圳市龙华区民治街道上芬社区龙屋工业区6号厂房101一、二楼) filed a patent application (PCT/CN2025/084054) for "MAGNETRON SPUTTERING APPARATUS FOR DETECTING SHORT CIRCUIT OF TARGET IN TIME BY MONITORING RESISTANCE BETWEEN PVD TARGET CATHODE AND ELECTRICAL GROUN...