GENEVA, Nov. 10 -- ARK INC. (1-7-20 Hiroo, Shibuya-ku, Tokyo1500021), 株式会社ＡＲＫ (東京都渋谷区広尾１－７－２０) filed a patent application (PCT/JP2024/016619) for "WATER QUALITY MONITORING SYSTEM FOR AQUACULTURE WATER, WATER QUALITY MONITORING METHOD FOR AQUACULTURE WATER, PROGRAM, COMBINATION OF PROGRAMS, AND WATER QUALITY MONITORING SYSTEM FOR PLANT CULTIVATION WATER" on Apr 28, 2024. With publication no. WO/2025/229697, the details related to the patent application was published on Nov 06, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is ...