INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "CONTROL OF TOPOLOGY AT TRENCH BOTTOM OR SELECTIVE REMOVAL OF DEPOSITED FILM FROM TOP OF FIN"

GENEVA, Aug. 19 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2025/013262) for "CONTROL OF TOPOLOGY AT TRENCH BOTTOM OR SELECTIVE REMOVAL OF DEPOSITED FILM FROM TOP OF FIN" on Jan 27, 2025. With publication no. WO/2025/170783, the details related to the patent application was published on Aug 14, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): NEMANI, Srinivas D. (3050 Bowers AvenueSanta Clara, California 95054), LING, Mang-Mang (3050 Bowers AvenueSanta Clara, California 95054), KIM, Jong Mun (3050 Bowers AvenueSanta Clara, Cal...