INTERNATIONAL PATENT: AGC INC., ＡＧＣ株式会社 FILES APPLICATION FOR "DISCHARGE GAS TREATMENT METHOD, HEAT TREATMENT METHOD, GLASS PRODUCTION METHOD, DISCHARGE GAS TREATMENT DEVICE, HEAT TREATMENT DEVICE AND GLASS PRODUCTION DEVICE"

GENEVA, June 11 -- AGC INC. (5-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008405), ＡＧＣ株式会社 (東京都千代田区丸の内一丁目５番１号) filed a patent application (PCT/JP2024/041222) for "DISCHARGE GAS TREATMENT METHOD, HEAT TREATMENT METHOD, GLASS PRODUCTION METHOD, DISCHARGE GAS TREATMENT DEVICE, HEAT TREATMENT DEVICE, AND GLASS PRODUCTION DEVICE" on Nov 21, 2024. With publication no. WO/2025/115741, the details related to the patent application was published on Jun 05, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by...