INTERNATIONAL PATENT: ACM RESEARCH (SHANGHAI),INC., 盛美半导体设备（上海）股份有限公司 FILES APPLICATION FOR "WAFER CLEANING METHOD AND APPARATUS"

GENEVA, May 17 -- ACM RESEARCH (SHANGHAI) , INC. (Building 4, No. 1690 Cai Lun RoadCHINA (SHANGHAI) PILOT FREE TRADE ZONEPudong New Area, Shanghai 201203), 盛美半导体设备（上海）股份有限公司 (中国上海市浦东新区中国（上海）自由贸易试验区蔡伦路1690号第4幢) filed a patent application (PCT/CN2024/122422) for "WAFER CLEANING METHOD AND APPARATUS" on Sep 29, 2024. With publication no. WO/2025/098060, the details related to the patent application was published on May 15, 2025.

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