INTERNATIONAL PATENT: ACM RESEARCH (SHANGHAI),INC., 盛美半导体设备（上海）股份有限公司, ACM RESEARCH KOREA CO., LTD., 盛美半导体设备韩国有限公司, CLEANCHIP TECHNOLOGIES LIMITED, 清芯科技有限公司 FILES APPLICATION FOR "NOZZLE CLEANING APPARATUS AND METHOD FOR COATING AND DEVELOPING DEVICE"

GENEVA, July 7 -- ACM RESEARCH (SHANGHAI) , INC. (BUILDING 4, NO. 1690 CAI LUN ROAD, CHINA (SHANGHAI) PILOT FREE TRADE ZONEPudong New Area, Shanghai 201203), 盛美半导体设备（上海）股份有限公司 (中国上海市浦东新区中国（上海）自由贸易试验区蔡伦路1690号第4幢), ACM RESEARCH KOREA CO., LTD. (#402, HYUNDAI CITY PLAZA, 2106 GYEONGCHUNG-DAERO, BUBAL-EUP, ICHEON-SIGyeonggi-do), 盛美半导体设备韩国有限公司 (&#...