INTERNATIONAL PATENT: ACM RESEARCH (SHANGHAI), INC., 盛美半导体设备（上海）股份有限公司 FILES APPLICATION FOR "PRESSURE MONITORING APPARATUS, SEMICONDUCTOR CLEANING DEVICE AND MONITORING METHOD THEREFOR"

Posted On: 2025-04-05

GENEVA, April 5 -- ACM RESEARCH (SHANGHAI), INC. (Building 4, No. 1690 Cai Lun Road, China (Shanghai) Pilot Free Trade ZonePudong New Area, Shanghai 201203), 盛美半导体设备（上海）股份有限公司 (中国上海市浦东新区中国（上海）自由贸易试验区蔡伦路1690号第4幢) filed a patent application (PCT/CN2024/116755) for "PRESSURE MONITORING APPARATUS, SEMICONDUCTOR CLEANING DEVICE, AND MONITORING METHOD THEREFOR" on Sep 04, 2024. With publication no. WO/2025/066823, the details related to ...

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INTERNATIONAL PATENT: ACM RESEARCH (SHANGHAI), INC., 盛美半导体设备（上海）股份有限公司 FILES APPLICATION FOR "PRESSURE MONITORING APPARATUS, SEMICONDUCTOR CLEANING DEVICE AND MONITORING METHOD THEREFOR"