INTERNATIONAL PATENT: ACM RESEARCH (SHANGHAI), INC., 盛美半导体设备（上海）股份有限公司 FILES APPLICATION FOR "CONTROL SYSTEM FOR BUBBLES IN LIQUID FILM AND WAFER CLEANING DEVICE AND WAFER CLEANING METHOD"

GENEVA, May 17 -- ACM RESEARCH (SHANGHAI), INC. (Building 4, No. 1690 Cai Lun RoadCHINA (SHANGHAI) PILOT FREE TRADE ZONEPudong New Area, Shanghai 201203), 盛美半导体设备（上海）股份有限公司 (中国上海市浦东新区中国（上海）自由贸易试验区蔡伦路1690号第4幢) filed a patent application (PCT/CN2024/122436) for "CONTROL SYSTEM FOR BUBBLES IN LIQUID FILM, AND WAFER CLEANING DEVICE AND WAFER CLEANING METHOD" on Sep 29, 2024. With publication no. WO/2025/098061, the details related to t...