Intellectual Property India Publishes Patent Application for 'Selective Treatment Of Fcc Gasoline For Removal Of Sulfur, Nitrogen, And Olefin Compounds While Maximizing Retention Of Aromatic Compounds' Filed by Lummus Technology Llc

MUMBAI, India, May 2 -- Intellectual Property India has published a patent application (202517036438 A) filed by Lummus Technology Llc, Houston, on April 15, for 'selective treatment of fcc gasoline for removal of sulfur, nitrogen, and olefin compounds while maximizing retention of aromatic compounds.'

Inventor(s) include Marri, Rama, Rao; Wang, Zhiliang; Chen, Liang; Laurin, Marc, Andrew; Xu, Yongqiang; Som, Manoj; Pham, Robert; and Boeger, Brian.

The application for the patent was published on May 2, under issue no. 18/2025.

According to the abstract released by the Intellectual Property India: "Systems and processes for the treatment of a naphtha range hydrocarbon feedstock comprising sulfur-containing compounds, nitrogen-containing c...