Intellectual Property India Publishes Patent Application for 'Photocatalyst Extrusion Methods, Photocatalyst Extrudates, And Photoreactors Employing Photocatalyst Extrudates' Filed by Syzygy Plasmonics Inc.

MUMBAI, India, March 7 -- Intellectual Property India has published a patent application (202517014392 A) filed by Syzygy Plasmonics Inc., Houston, on Feb. 19, for 'photocatalyst extrusion methods, photocatalyst extrudates, and photoreactors employing photocatalyst extrudates.'

Inventor(s) include Khatiwada, Suman; Shadabipour, Parisa; Chapman, Jonathan Morris; Robatjazi, Hossein; Shah, Shreya; Herrera Gutierrez, Danniela Cristina; and Mettu, Anilkumar.

The application for the patent was published on March 7, under issue no. 10/2025.

According to the abstract released by the Intellectual Property India: "Methods and manufacturing processes for photocatalyst extrusion, extrudate photocatalysts, and photoreactor utilizing extrudate photoca...