Intellectual Property India Publishes Patent Application for 'Heat Cycle Working Medium, And Heat Cycle System Composition' Filed by Agc Inc.

MUMBAI, India, May 30 -- Intellectual Property India has published a patent application (202517042962 A) filed by Agc Inc., Tokyo, on May 3, for 'heat cycle working medium, and heat cycle system composition.'

Inventor(s) include Hayamizu, Hiroki; and Fukushima, Masato.

The application for the patent was published on May 30, under issue no. 22/2025.

According to the abstract released by the Intellectual Property India: "A heat cycle working medium containing trifluoroethylene, 1,1-difluoroethane, and (E)-1,3,3,3-tetrafluoropropene."

The patent application was internationally filed on Oct. 23, 2023, under International application No.PCT/JP2023/038219.

Disclaimer: Curated by HT Syndication....