Intellectual Property India Publishes Patent Application for 'Fake Account Protection In Social Media Using Machine Learning' Filed by Greater Noida Institute Of Technology; Dipali Singh; Beauty Jaysawal; Archana; Deepal Sharma; Arpita Gaur; Shazia Aiyub; Deepika Kumari; and Anupma Surya

MUMBAI, India, Jan. 23 -- Intellectual Property India has published a patent application (202511127388 A) filed by Greater Noida Institute Of Technology; Dipali Singh; Beauty Jaysawal; Archana; Deepal Sharma; Arpita Gaur; Shazia Aiyub; Deepika Kumari; and Anupma Surya, Greater Noida, Uttar Pradesh, on Dec. 16, 2025, for 'fake account protection in social media using machine learning.'

Inventor(s) include Dipali Singh; Beauty Jaysawal; Archana; Deepal Sharma; Arpita Gaur; Shazia Aiyub; Deepika Kumari; and Anupma Surya.

The application for the patent was published on Jan. 23, under issue no. 04/2026.

According to the abstract released by the Intellectual Property India: "The present invention relates to an intelligent system for detecting ...