US Patent Issued to SHIN-ETSU CHEMICAL on May 12 for "Resist composition and pattern forming process" (Japanese Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,625,429, issued on May 12, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo). "Resist composition and pattern forming process" was invented by... Read More

US Patent Issued to DuPont Specialty Materials Korea on May 12 for "Colored photosensitive resin composition and mutilayer cured film prepared therefrom" (South Korean Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,625,430, issued on May 12, was assigned to DuPont Specialty Materials Korea Ltd. (South Korea). "Colored photosensitive resin composition and mu... Read More

US Patent Issued to NISSAN CHEMICAL on May 12 for "EUV resist underlayer film-forming composition" (Japanese Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,625,431, issued on May 12, was assigned to NISSAN CHEMICAL Corp. (Tokyo). "EUV resist underlayer film-forming composition" was invented by Shou ... Read More

US Patent Issued to Tokyo Electron on May 12 for "Methods of forming patterns" (New York, Massachusetts, Florida Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,625,432, issued on May 12, was assigned to Tokyo Electron Ltd. (Tokyo). "Methods of forming patterns" was invented by Daniel Fulford (Cohoes, N.... Read More

US Patent Issued to NIKON on May 12 for "Spatial light modulation unit and exposure apparatus" (Japanese Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,625,433, issued on May 12, was assigned to NIKON Corp. (Tokyo). "Spatial light modulation unit and exposure apparatus" was invented by Yasuhito ... Read More

US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on May 12 for "Lithography scanner throughput" (Taiwanese Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,625,434, issued on May 12, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Lithography scanner throughput" w... Read More

US Patent Issued to GUDENG PRECISION INDUSTRIAL on May 12 for "Reticle storage cabinet system and method using the same" (Taiwanese Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,625,435, issued on May 12, was assigned to GUDENG PRECISION INDUSTRIAL Co. LTD. (New Taipei, Taiwan). "Reticle storage cabinet system and method... Read More

US Patent Issued to SAMSUNG ELECTRONICS on May 12 for "Lithography apparatus" (South Korean Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,625,436, issued on May 12, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea). "Lithography apparatus" was invented by Sung Yo... Read More

US Patent Issued to Tokyo Electron on May 12 for "Substrate processing apparatus and substrate processing method" (Japanese Inventor)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,625,437, issued on May 12, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate processing apparatus and substrate processing method" was inv... Read More

US Patent Issued to ASML Netherlands on May 12 for "Interface plate, inspection system and method of installing an inspection system" (Dutch, American Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,625,438, issued on May 12, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands). "Interface plate, inspection system and method of ins... Read More

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