US Patent Issued to CORNING on May 5 for "Anti-reflective coatings for IR-transmitting substrates" (New Hampshire Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,618,138, issued on May 5, was assigned to CORNING Inc. (Corning, N.Y.). "Anti-reflective coatings for IR-transmitting substrates" was invented by... Read More

US Patent Issued to POSCO on May 5 for "Manufacturing method for plated steel material having excellent adhesion to plating and corrosion resistance" (South Korean Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,618,139, issued on May 5, was assigned to POSCO Co. LTD (Pohang-si, South Korea). "Manufacturing method for plated steel material having excellen... Read More

US Patent Issued to ELTRO on May 5 for "Method for surface coating according to the sputtering principle" (German Inventor)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,618,140, issued on May 5, was assigned to ELTRO GmbH (Baesweiler, Germany). "Method for surface coating according to the sputtering principle" wa... Read More

US Patent Issued to IDEMITSU KOSAN on May 5 for "Sintered body, sputtering target, oxide thin film, thin film transistor, electronic equipment, and method for producing sintered body" (Japanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,618,141, issued on May 5, was assigned to IDEMITSU KOSAN Co. LTD. (Tokyo). "Sintered body, sputtering target, oxide thin film, thin film transist... Read More

US Patent Issued to Tokyo Electron on May 5 for "Substrate processing apparatus and substrate processing method" (Japanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,618,142, issued on May 5, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate processing apparatus and substrate processing method" was inven... Read More

US Patent Issued on May 5 for "Vacuum coating apparatus for uniformly distributing metal vapor using uniform mixing buffer structure" (Chinese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,618,143, issued on May 5. "Vacuum coating apparatus for uniformly distributing metal vapor using uniform mixing buffer structure" was invented by... Read More

US Patent Issued to Applied Materials on May 5 for "Surface treatment for selective deposition" (California Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,618,144, issued on May 5, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Surface treatment for selective deposition" was invented... Read More

US Patent Issued to Tokyo Electron on May 5 for "Film-forming method and film-forming apparatus" (Japanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,618,145, issued on May 5, was assigned to Tokyo Electron Ltd. (Tokyo). "Film-forming method and film-forming apparatus" was invented by Takashi C... Read More

US Patent Issued to The University of Hong Kong on May 5 for "System and method for forming large-area electronic-grade metal chalcogen thin films" (Chinese, Taiwanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,618,146, issued on May 5, was assigned to The University of Hong Kong (China). "System and method for forming large-area electronic-grade metal c... Read More

US Patent Issued to Applied Materials on May 5 for "Methods for depositing phosphorus-doped silicon nitride films" (California Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,618,147, issued on May 5, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Methods for depositing phosphorus-doped silicon nitride ... Read More

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