ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,243, issued on July 21, was assigned to International Business Machines Corp. (Armonk, N.Y.). "Stacked field-effect transistors having latc... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,244, issued on July 21, was assigned to INTERNATIONAL BUSINESS MACHINES Corp. (Armonk, N.Y.). "Deep backside power rail cut" was invented b... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,245, issued on July 21, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea). "Integrated circuit device" was invented by J... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,246, issued on July 21, was assigned to International Business Machines Corp. (Armonk, N.Y.). "Semiconductor contact area matching" was inv... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,247, issued on July 21, was assigned to International Business Machines Corp. (Armonk, N.Y.). "Steep-switching transistor including three-d... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,248, issued on July 21, was assigned to GlobalFoundries U.S. Inc. (Malta, N.Y.). "Transistor structures with interleaved body contacts and ... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,249, issued on July 21, was assigned to FLOSFIA INC. (Kyoto, Japan). "Electrically-conductive metal oxide film including a metal oxide havi... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,250, issued on July 21, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan) and NATIONAL TAIWAN UNIVERSITY (Ta... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,251, issued on July 21, was assigned to Adeia Semiconductor Solutions LLC (San Jose, Calif.). "Method of forming nanosheet field effect tra... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,252, issued on July 21, was assigned to NXP USA INC. (Austin, Texas). "Transistor gate structure with insulating layer and method of fabric... Read More